http://permalink.gmane.org/gmane.science.microelectromechanical-systems hourly 1 1901-01-01T00:00+00:00 http://gmane.org/img/gmane-25t.png http://gmane.org http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18851 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/897/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology LAST POWER to boost SiC &amp;amp;amp; GaN power microelectronics The consortium members are STMicroelectronics (Italy), project coordinator, LPE/ETC (Italy), Institute for Microelectronics and Microsystems of the National Research Council - IMM-CNR (Italy), Foundation for Research &amp;amp; Technology-Hellas - FORTH (Greece ... today Compound Semiconductor [url: http://www.compoundsemiconductor.net/csc/news-details/id/19736362/name/LAST-POWER-to-boost-SiC-&amp;amp;-GaN-power-microelectronic.html] ULIS Launches Thermal Sensor Array Product Line, within Scope of European ... Led by ULIS, MIRTIC project partners include: CEA-Leti, a leading microelectronic and nanotechnology research center, Integrated Systems Development, a global systems integrator, Metaio, a developer of augmented reality technology and Schne</pre> MEMS News 2013-05-17T19:21:35 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18850 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/896/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology UV Laser delivers greater than 45 W output. Spectra-Physics&amp;#39; new laser has been demonstrated to enable major advances in the fast, precision manufacturing of many types of microelectronic devices and components. “With over 10,000 UV lasers deployed, Spectra-Physics is the leader in UV lasers, ... yesterday ThomasNet Industrial News Room [url: http://news.thomasnet.com/fullstory/UV-Laser-delivers-greater-than-45-W-output-20008294] Tech Gets Phones On Your Wavelength In work to be presented in June at the International Conference on Solid-State Sensors, Actuators and Microsystems, Dana Weinstein, professor of electrical engineering and computer science, and Laura Popa, a graduate student in physics, built a ... today Discovery News [url: http://news.discovery.com/tech/gear-and-gadgets/tech-get</pre> MEMS News 2013-05-16T21:26:05 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18849 <pre>Hi Anton, Yes, there are a number of commercial systems. See http://www.emotiv.com/ they have a whole headset. There's also a really interesting TED talk about a mind-reading headset - http://www.youtube.com/watch?v=fVhggGSjXVg Cheers, Michael On Wed, May 15, 2013 at 8:21 PM, masgandhul &lt;masgandhul&lt; at &gt;gmail.com&gt; wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Michael Martin 2013-05-16T14:11:01 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18848 <pre>Hello everyone, I'm a new member here, I did not know however, my question had been asked before. Is there any or many devices or sensors that able to handle EEG for full head reading? not only in some part of our head, but for the whole head. Thank you </pre> masgandhul 2013-05-16T00:21:31 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18847 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/895/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology ULIS Launches Thermal Sensor Array Product Line, Within Scope Of European ... Led by ULIS, MIRTIC project partners include: CEA-Leti, a leading microelectronic and nanotechnology research center, Integrated Systems Development, a global systems integrator, Metaio, a developer of augmented reality technology and Schneider ... today Photonics Online [url: http://www.photonicsonline.com/Doc/ulis-thermal-sensor-array-product-line-european-mirtic-project-0001] Solar Panels as Inexpensive as Paint? ... in nanphotonics, biophotonics, hybrid inorganic/organic materials and devices, nonlinear and fiber optics, metamaterials, nanoplasmonics, optofluidics, microelectromechanical systems (MEMS), biomedical microelectromechanical systems (BioMEMs), ... today Lab Manager Magazine [url: http://www.labmanager.com</pre> MEMS News 2013-05-15T20:07:59 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18846 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/894/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology How to improve heat dissipation in 3-D microelectronic systems “What we are talking about here is boiling that will take place in passages that are produced by microfabrication techniques that may be only 50 micrometers by 50 micrometers. The physics of what will be going on there is very different than what ... today Design World Network [url: http://www.designworldonline.com/how-to-improve-heat-dissipation-in-3-d-microelectronic-systems/] First precise MEMS output measurement technique unveiled - R&amp;amp;amp;D Magazine This is an example of a MEMS device whose accurate resonant frequency was measured by the The commercial application of MEMS, or microelectromechanical systems, will receive a major boost today following the presentation of a brand new way to ... today R &amp;amp; D Magazine [url: htt</pre> MEMS News 2013-05-14T19:53:47 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18845 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/893/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology Optical Gratings Could Make Quantum Tech Portable While advances have been made in producing portable sensors, simplifying atomic cooling and loading using microfabrication techniques has proved difficult, the researchers said. Their work addresses the problem by delivering &amp;quot;ten thousand times more ... 2013-05-10 Photonics.com [url: http://www.photonics.com/Article.aspx?AID=53866] Industrial Picosecond Laser suits micromachining applications. Santa Clara, CA – Spectra-Physics®, a Newport Corporation brand, introduces Spirit™ ps 1040-10, an industrial-grade picosecond laser for precision micromachining applications. The new laser delivers high finesse with exceptional beam quality (M2&amp;lt; 1.2 ... 2013-05-10 ThomasNet Industrial News Room [url: http://news.thomasnet.com/fullstory/Industria</pre> MEMS News 2013-05-13T19:09:38 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18844 <pre>Dear all, I'm currently using photoresists uv26. I need to reflow the resist. But I tried several temperature still it couldn't hit the profile I want. At lower temperature like 165C the reflow is not enough; when I try to go higher like 180C the resist burnt. Any comments or advice about this photoresists is very much welcomed. Thank you in advance. Best Regards, Jocelyn Sent from my iPhone _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Jocelyn Ng 2013-05-10T07:31:11 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18843 <pre>View Mailing Online [url: http://www.memsnet.org/news/mailings/892/] MEMS Express is brought to you by MNX [url: http://www.mems-exchange.org]: your microsystem design and fabrication partner MEMS technology New Device Uses Microtips for Quick DNA Extraction from Liquid Samples (w ... The tiny probes, called microtips and nanotips, were designed and built at the UW in a micro-fabrication facility where a technician can make up to 1 million tips in a year, which is key in proving that large-scale production is feasible, [Jae-Hyun ... yesterday Medgadget.com [url: http://www.medgadget.com/2013/05/new-device-uses-microtips-for-quick-dna-extraction-from-liquid-samples-wvideo.html] QM researchers lead trial of revolutionary new device-based treatment for high ... ... in biomarker discovery (“pathogen-specific fingerprints”) which require minimal sample processing steps, nano-enabled sensors, temperature-stable biomimetic capture coatings, nanoparticles, microelectronics, microfluidics, wireless network</pre> MEMS News 2013-05-09T19:23:50 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18842 <pre>try www.matweb.com On Thu, May 9, 2013 at 4:48 AM, Md A Muztoba &lt;mamuztoba11&lt; at &gt;students.desu.edu&gt;wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Azeem Zulfiqar 2013-05-09T16:49:52 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18841 <pre>Ahmad: Typical etch chemistries for SiN will attack the PR as well. You are seeing profilometry step heights of &lt;2.4um because you are removing some of the PR as well as the 0.4um SiN layer. You would need to strip the remaining PR and take another profilomtery measurement to get an accurate measure of the SiN/Si step height. (The SiN etch will likely etch the underlying Si as well as the SiN.) Typical etch selectivites for fluorine-based SiN-etch chemistries are in the range of 1-2:1, so you'd expect to remove about 2600-5200A of the PR for a 130% etch. To address your original question about how much PR is required, the 2um PR thickness should be sufficient. For the typical SiN/PR selectivities in the range of 1-2:1 (SiN/PR), the 2um thickness gives you some overhead to maintain your edge profile. At some point though, you may need to include other characteristics of your etch, such as profile angle and residues to determine if your process is acceptable. Robert -----Original Message----- From:</pre> Robert Ditizio 2013-05-09T17:50:42 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18840 <pre>Once the nitride film is etched, fluorine will etch the silicon substrate very fast, so measurements need to account for that. On Wed, May 8, 2013 at 11:33 PM, Haider, Ahmad M &lt;ahaider3&lt; at &gt;gatech.edu&gt;wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Andrew Sarangan 2013-05-09T17:04:07 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18839 <pre>Hi Ahmad. I assume that you mean Silicon nitride layer. It depends on what kind of gas and condition do you use but typically in my case more than 2 times thickness of conventional Photo resist layer was enough to endure etch process. With CF4 gas (RF power ~60W, pressure ~60mtorr, ?? SCCM , RIE 2000 South bay tech.) Best. Myung Rae Cho PhD. candidate Department of Physics &amp; Astronomy Seoul National University Seoul 151-747 Korea Tel: +82-2-885-2361 Fax: +82-2-882-2361 mobile: +82-10-6475-5495 insammael&lt; at &gt;gmail.com insammael&lt; at &gt;ydplab.snu.ac.kr On Thu May 9 05:29:49 2013, Haider, Ahmad M wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> MRC gmail 2013-05-08T21:26:22 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18838 <pre>It depends on how thick your nitride is, and what chemistry you are using. I can get about a 1:1 etch selectivity between a positive hard baked resist and LPCVD silicon nitride, using CF4/O2 in a pure RIE mode. On Wed, May 8, 2013 at 4:29 PM, Haider, Ahmad M &lt;ahaider3&lt; at &gt;gatech.edu&gt; wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Andrew Sarangan 2013-05-08T20:47:42 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18837 <pre>Thanks Lou, I got that. The thing is that my Si wafer has a SiN layer on top of which 2 um resist acts a mask. I want to do a plasma(Oxford endpoint RIE) etch exposed portions of SiN (and not Si beneath it). The exposed SiN layer is 400 nm thick and consists of a series of 25 um squares. Overall, if the whole exposed SiN is etched, I should get a step depth of 2.4 um on the profilometer. I etch for 130% of the required etch time to etch all 400 nm of nitride. However, when I measure the step depth on profilometer, it always shows me that the depth is less than 2.4 um. I can't fathom the reason behind it. Could it be because my features are very small? Thanks Ahmad ----- Original Message ----- From: "Lou Chomas" &lt;lchomas&lt; at &gt;hotmail.com&gt; To: "Ahmad M Haider" &lt;ahaider3&lt; at &gt;gatech.edu&gt; Sent: Thursday, May 9, 2013 12:00:18 AM Subject: RE: [mems-talk] Resist thickness for nitride etch Hi Ahmad, If the layer under the nitride or resist that you are measuring is also etched (silicon, oxide, etc.) you will measure </pre> Haider, Ahmad M 2013-05-09T04:15:21 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18836 <pre>Hi Lou, What do you mean by "Be careful to account for any etching into the substrate if you are using a profilometer to measure the thickness." I use the dektak profilometer to measure the thickness in order to verify if the RIE plasma etcher was able to remove all exposed silicon nitride. Thanks, Ahmad ----- Original Message ----- From: "Lou Chomas" &lt;lchomas&lt; at &gt;hotmail.com&gt; To: "General MEMS discussion" &lt;mems-talk&lt; at &gt;memsnet.org&gt; Sent: Wednesday, May 8, 2013 5:09:30 PM Subject: Re: [mems-talk] Resist thickness for nitride etch Ahmad, That depends a lot on your process. I would recommend putting some resist down with your pattern on a test wafer and etching for some amount of time. Pick something less than your total etch, but not too short. Measure the thickness of the resist before and after and then you can calculate whether the thickness will be sufficient. Be careful to account for any etching into the substrate if you are using a profilometer to measure the thickness. If your recipe has a lot of</pre> Haider, Ahmad M 2013-05-09T03:33:17 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18835 <pre>Hello all, I need to know the specific heat, thermal conductivity, density, young modulas and Poisson ratio of Ca modified Lead Titanate for finite element analysis. Any link/source to this kind of information will be greatly appreciated. Thanks. Muztoba _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Md A Muztoba 2013-05-09T02:48:43 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18834 <pre>Hi Hong, The wafer cathode holder is critical in electroforming. The contacts must be sealed off from the plating solution to avoid being welded to your wafer. Also, a current thief must be used to obtain uniformity. I can help you with plating tools. Regards, Dave David Roberts (Principal) Silicon Valley Wafer Plating Santa Clara, CA (408)469-3203 www.waferplating.com _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Dave Roberts 2013-05-08T23:34:34 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18833 <pre>Ahmad, That depends a lot on your process. I would recommend putting some resist down with your pattern on a test wafer and etching for some amount of time. Pick something less than your total etch, but not too short. Measure the thickness of the resist before and after and then you can calculate whether the thickness will be sufficient. Be careful to account for any etching into the substrate if you are using a profilometer to measure the thickness. If your recipe has a lot of oxygen, the rate against the resist will likely be very high. -Lou _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Lou Chomas 2013-05-08T21:09:30 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18832 <pre>Hi Jen, It might help to do a somewhat aggressive oxygen plasma clean of your sample in the DRIE to help remove telflon-like polymer from the wafer surface. Cleaning after DRIE, in general can be quite challenging. Cheers, Michael On Sun, May 5, 2013 at 1:59 AM, HJ Rhee &lt;hjrhee00&lt; at &gt;gmail.com&gt; wrote: _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Michael Martin 2013-05-08T15:51:46 http://permalink.gmane.org/gmane.science.microelectromechanical-systems/18831 <pre>Hi I am trying to do an anisotropic etch of 400 nm nitride layer in a RIE machine. A portion of the nitride is protected by a resist layer on top of it. Can you tell approximate how much thickness of resist would I need so that the resist doesn't get stripped off during the nitride etch? Thanks, Ahmad _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk </pre> Haider, Ahmad M 2013-05-08T20:29:49 Search the mailing list at Gmane query http://search.gmane.org/?group=$group=gmane.science.microelectromechanical-systems